Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs. - François Andrieu; Mikaël Cassé; E. Baylac; P. Perreau; O. Nier; Denis Rideau; R. Berthelon; Franck Pourchon; A. Pofelski; Barbara De Salvo; C. Gallon; Vincent Mazzocchi; et al. (ESSDERC, 2014)

Modeling self-heating effects in advanced CMOS nodes. - M. Arabi; A. Cros; X. Federspiel; Cheikh Ndiaye; Vincent Huard; M. Rafik (IRPS, 2018)