Device photolithography: The primary pattern generator part i-optical design. - Morton J. Cowan; D. R. Herriott; A. M. Johnson; A. Zacharias (Bell Syst. Tech. J., 1970)

Device photolithography: The primary pattern generator part IV-alignment and performance evaluation. - A. M. Johnson; A. Zacharias (Bell Syst. Tech. J., 1970)

An economic model for investing in sulfur oxide control technology development. - R. G. Thompson; R. R. Hocking; A. M. Johnson (Ann. Oper. Res., 1984)