Device photolithography: The primary pattern generator part i-optical design. - Morton J. Cowan; D. R. Herriott; A. M. Johnson; A. Zacharias (Bell Syst. Tech. J., 1970)

Device photolithography: The primary pattern generator part iii-the control system. - Patrick G. Dowd; Morton J. Cowan; Peter E. Rosenfeld; A. Zacharias (Bell Syst. Tech. J., 1970)

Device photolithography: The primary pattern generator part IV-alignment and performance evaluation. - A. M. Johnson; A. Zacharias (Bell Syst. Tech. J., 1970)