Reliability aspects of gate oxide under ESD pulse stress. - Adrien Ille; Wolfgang Stadler; Thomas Pompl; Harald Gossner; Tilo Brodbeck; Kai Esmark; Philipp Riess; David Alvarez; Kiran V. Chatty; Robert Gauthier 002; Alain Bravaix (Microelectron. Reliab., 2009)