Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate. - Teruo Matsuzawa; Akemi Moniwa; N. Hasegawa; Hideo Sunami (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1987)

A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment. - Akemi Moniwa; Toshiharu Matsuzawa; Tetsuo Ito; Hideo Sunami (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1987)

A Two-Dimensional Integrated Process Simulator: SPIRIT-I. - Masanori Ohgo; Yasuko Takano; Akemi Moniwa; Shuichi Yamamoto; Yoshio Sakai; Hiroo Masuda; Hideo Sunami (IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 1987)