An optimized 1.0- mu m CMOS technology for next-generation channelless gate arrays. - Yukihiro Ushiku; Teruo Kobayashi; Akito Yoshida; Nobuyuki Itoh; Akira Nishiyama; Rempei Nakata (IEEE J. Solid State Circuits, 1988)

Effects of La2O3 incorporation in HfO2 gated nMOSFETs on low-frequency noise. - D. Zade; Soshi Sato; Kuniyuki Kakushima; A. Srivastava; Parhat Ahmet; Kazuo Tsutsui; Akira Nishiyama; Nobuyuki Sugii; Kenji Natori; Takeo Hattori; Chandan Kumar Sarkar; Hiroshi Iwai (Microelectron. Reliab., 2011)

(100)- and (110)-oriented nMOSFETs with highly scaled EOT in La-silicate/Si interface for multi-gate architecture. - Takamasa Kawanago; Kuniyuki Kakushima; Parhat Ahmet; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Kazuo Tsutsui; Kenji Natori; Takeo Hattori; Hiroshi Iwai (ESSDERC, 2012)

Resistive switching behavior of a CeO2 based ReRAM cell incorporated with Si buffer layer. - Chunmeng Dou; Kuniyuki Kakushima; Parhat Ahmet; Kazuo Tsutsui; Akira Nishiyama; Nobuyuki Sugii; Kenji Natori; Takeo Hattori; Hiroshi Iwai (Microelectron. Reliab., 2012)

Oxide and interface trap densities estimation in ultrathin W/La2O3/Si MOS capacitors. - M. Mamatrishat; T. Kubota; T. Seki; Kuniyuki Kakushima; Parhat Ahmet; Kazuo Tsutsui; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Kenji Natori; Takeo Hattori; Hiroshi Iwai (Microelectron. Reliab., 2012)

Advantage of TiN Schottky gate over conventional Ni for improved electrical characteristics in AlGaN/GaN HEMT. - Takamasa Kawanago; Kuniyuki Kakushima; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Hitoshi Wakabayashi; Kazuo Tsutsui; Kenji Natori; Hiroshi Iwai (ESSDERC, 2013)

Precision Controlled Variable Phase Filter for Imaging Type Two-Dimensional Spectroscopic Tomography. - Pradeep Kumara Wijesekara Abeygunawardhana; Satoru Suzuki; Ichirou Ishimaru; Akira Nishiyama (SocialCom, 2013)

Chromatin Properties of Regulatory DNA Probed by Manipulation of Transcription Factors. - Alexei A. Sharov; Akira Nishiyama; Yong Qian; Dawood B. Dudekula; Dan L. Longo; David Schlessinger; Minoru S. H. Ko (J. Comput. Biol., 2014)

Characterization of interface state density of three-dimensional Si nanostructure by charge pumping measurement. - Chunmeng Dou; Tomoya Shoji; Kazuhiro Nakajima; Kuniyuki Kakushima; Parhat Ahmet; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Hitoshi Wakabayashi; Kazuo Tsutsui; Kenji Natori; Hiroshi Iwai (Microelectron. Reliab., 2014)

A novel hetero-junction Tunnel-FET using Semiconducting silicide-Silicon contact and its scalability. - Yan Wu; Hiroyuki Hasegawa; Kuniyuki Kakushima; Kenji Ohmori; Takanobu Watanabe; Akira Nishiyama; Nobuyuki Sugii; Hitoshi Wakabayashi; Kazuo Tsutsui; Yoshinori Kataoka; Kenji Natori; Keisaku Yamada; et al. (Microelectron. Reliab., 2014)

Improvement of charge/discharge performance for lithium ion batteries with tungsten trioxide electrodes. - Wei Li; Akito Sasaki; Hideyuki Oozu; Katsuaki Aoki; Kuniyuki Kakushima; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Hitoshi Wakabayashi; Kazuo Tsutsui; Kenji Natori; Hiroshi Iwai (Microelectron. Reliab., 2015)

Electron transport mechanism of tungsten trioxide powder thin film studied by investigating effect of annealing on resistivity. - Wei Li; Akito Sasaki; Hideyuki Oozu; Katsuaki Aoki; Kuniyuki Kakushima; Yoshinori Kataoka; Akira Nishiyama; Nobuyuki Sugii; Hitoshi Wakabayashi; Kazuo Tsutsui; Kenji Natori; Hiroshi Iwai (Microelectron. Reliab., 2015)

Infrared Emission Spectroscopic Imaging of Microplastics Using Long-Wavelength Infrared Hyperspectral Camera with Imaging-Type Two-Dimensional Fourier Spectroscopy. - Kosuke Nogo; Kou Ikejima; Wei Qi; Tomoya Kitazaki; Hiroshi Kanasaki; Kazushi Hamada; Kenji Wada; Akira Nishiyama; Ichiro Ishimaru (WHISPERS, 2021)

Process Planning with Removal of Melting Penetration and Temper Colors in 5-Axis Hybrid Additive and Subtractive Manufacturing. - Akira Nishiyama; Shun Kayashima; Nobuyuki Sumi; Takashi Hashimoto; Takeyuki Abe; Jun'ichi Kaneko (Int. J. Autom. Technol., 2023)