Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey. - W. Deweerd; Vidya Kaushik; J. Chen; Y. Shimamoto; Tom Schram; L.-Å. Ragnarsson; Annelies Delabie; Luigi Pantisano; B. Eyckens; J. W. Maes (Microelectron. Reliab., 2005)

Observation and characterization of defects in HfO2 high-K gate dielectric layers. - Vidya Kaushik; Martine Claes; Annelies Delabie; Sven Van Elshocht; Olivier Richard; Thierry Conard; Erika Rohr; Thomas Witters; Matty Caymax; Stefan De Gendt (Microelectron. Reliab., 2005)

WS2 transistors on 300 mm wafers with BEOL compatibility. - Tom Schram; Quentin Smets; Benjamin Groven; M. H. Heyne; E. Kunnen; A. Thiam; Katia Devriendt; Annelies Delabie; Dennis Lin; M. Lux; Daniele Chiappe; I. Asselberghs; et al. (ESSDERC, 2017)