Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM. - Donna R. Cote; Son Van Nguyen; William J. Cote; Scott L. Pennington; Anthony K. Stamper; Dragan V. Podlesnik (IBM J. Res. Dev., 1995)

Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. - Donna R. Cote; Son Van Nguyen; Anthony K. Stamper; Douglas S. Armbrust; Dirk Tobben; Richard A. Conti; Gill Yong Lee (IBM J. Res. Dev., 1999)