Oxide reliability: influence of interface roughness, structure layout, and depletion layer formation. - Bakuri Lanchava; Peter Baumgartner 005; Andreas Martin; Armand Beyer; Erich Mueller (Microelectron. Reliab., 2001)

Empirical BEOL-TDDB evaluation based on I(t)-trace analysis. - Oliver Aubel; Armand Beyer; Georg Talut; Martin Gall (Microelectron. Reliab., 2014)