Electrical Characterization of Aluminum-Oxynitride Stacked Gate Dielectrics Prepared by a Layer-by-Layer Process of Chemical Vapor Deposition and Rapid Thermal Nitridation. - Hideki Murakami; Wataru Mizubayashi; Hirokazu Yokoi; Atsushi Suyama; Seiichi Miyazaki (IEICE Trans. Electron., 2005)