Improving the electrical characteristics of MOS transistors with CeO2/La2O3 stacked gate dielectric. - B. L. Yang; Hei Wong; Kuniyuki Kakushima; Hiroshi Iwai (Microelectron. Reliab., 2012)

Thermal and voltage instabilities of hafnium oxide films prepared by sputtering technique. - Hei Wong; B. L. Yang; Shurong Dong (Microelectron. Reliab., 2013)

Temperature dependences of threshold voltage and drain-induced barrier lowering in 60 nm gate length MOS transistors. - Zehua Chen; Hei Wong; Yan Han; Shurong Dong; B. L. Yang (Microelectron. Reliab., 2014)

On the current conduction mechanisms of CeO2/La2O3 stacked gate dielectric. - Xuan Feng; Hei Wong; B. L. Yang; Shurong Dong; Hiroshi Iwai; Kuniyuki Kakushima (Microelectron. Reliab., 2014)