Electrical properties of MIS capacitor using low temperature electron beam gun - evaporated HfAlO dielectrics. - V. Mikhelashvili; B. Meyler; J. Shneider; O. Kreinin; Gadi Eisenstein (Microelectron. Reliab., 2005)

Peculiarities of hole trapping in Al2O3-SiO2 gate dielectric stack. - M. Lisiansky; Y. Raskin; Y. Roizin; B. Meyler; S. Yofis; Y. Shneider (Microelectron. Reliab., 2017)