Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. - Frédéric Marty; Lionel Rousseau; Bassam Saadany; B. Mercier; Olivier Français; Y. Mita; Tarik Bourouina (Microelectron. J., 2005)

Highly Efficient Micromachined Bragg Mirrors Using Advanced DRIE Process. - Bassam Saadany; Diaa A. Khalil; Tarik Bourouina (ICMENS, 2006)