Atomic force microscopy (AFM) and X-ray diffraction (XRD) investigations of copper thin films prepared by dc magnetron sputtering technique. - Kah-Yoong Chan; Bee-San Teo (Microelectron. J., 2006)

Thickness dependence of the structural and electrical properties of copper films deposited by dc magnetron sputtering technique. - Kah-Yoong Chan; Teck-Yong Tou; Bee-San Teo (Microelectron. J., 2006)

Effects of substrate temperature on electrical and structural properties of copper thin films. - Kah-Yoong Chan; Teck-Yong Tou; Bee-San Teo (Microelectron. J., 2006)

Investigation into the influence of direct current (DC) power in the magnetron sputtering process on the copper crystallite size. - Kah-Yoong Chan; Bee-San Teo (Microelectron. J., 2007)