First Results in Patterning of Ultra High Aspect Ratio Microstructures by a 4T Wave Length Shifter at BESSY. - Martin Bednarzik; Heinz-Ulrich Scheunemann; Alexander Barth; Daniel Schondelmaier; Bernd Loechel (ICMENS, 2003)

Fabrication of Ultra Thick, Ultra High Aspect Ratio Microcomponents by Deep and Ultra Deep X-Ray Lithography. - Linke Jian; Bernd Loechel; Heinz-Ulrich Scheunemann; Martin Bednarzik; Yohannes M. Desta; Jost Goettert (ICMENS, 2003)