Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability. - Michael J. Mutch; Thomas Pomorski; Brad C. Bittel; Corey J. Cochrane; Patrick M. Lenahan; Xin Liu; Robert J. Nemanich; Justin Brockman; Marc French; Markus Kuhn; Benjamin French; Sean W. King (Microelectron. Reliab., 2016)