Effect of Pre-Existing Defects on Reliability Assessment of High-K Gate Dielectrics. - Gennadi Bersuker; Jang H. Sim; Chadwin D. Young; Rino Choi; Peter Zeitzoff; George A. Brown; Byoung Hun Lee; Robert W. Murto (Microelectron. Reliab., 2004)

Probing stress effects in HfO2 gate stacks with time dependent measurements. - Chadwin D. Young; Gennadi Bersuker; Yuegang Zhao; Jeff J. Peterson; Joel Barnett; George A. Brown; Jang H. Sim; Rino Choi; Byoung Hun Lee; Peter Zeitzoff (Microelectron. Reliab., 2005)

Electrical characterization and analysis techniques for the high-kappa era. - Chadwin D. Young; Dawei Heh; Arnost Neugroschel; Rino Choi; Byoung Hun Lee; Gennadi Bersuker (Microelectron. Reliab., 2007)

Metal Decoration Effects on the Gas-Sensing Properties of 2D Hybrid-Structures on Flexible Substrates. - Byungjin Cho; Jongwon Yoon; Sung Kwan Lim; Ah Ra Kim; Sun-Young Choi; Dong-Ho Kim; Kyu-Hwan Lee; Byoung Hun Lee; Heung Cho Ko; Myung Gwan Hahm (Sensors, 2015)

Neuromorphic Hardware System for Visual Pattern Recognition With Memristor Array and CMOS Neuron. - Myonglae Chu; Byoungho Kim; Sangsu Park; Hyunsang Hwang; Moongu Jeon; Byoung Hun Lee; Byung-Geun Lee (IEEE Trans. Ind. Electron., 2015)

Design of Ratioless Ternary Inverter Using Graphene Barristor. - Sunwoo Heo; Jinwoo Noh; Yun Ji Kim; So-Young Kim; Abdul Karim Khan; Byoung Hun Lee (ISMVL, 2016)

Reliability characteristics of MIM capacitor studied with ΔC-F characteristics. - Soo Cheol Kang; Sang Kyung Lee; S. Heo; S. M. Kim; Sung Kwan Lim; Byoung Hun Lee (IRPS, 2018)

Demonstration of ternary devices and circuits using dual channel graphene barristors. - So-Young Kim; Sunwoo Heo; Kiyung Kim; Myungwoo Son; Seung-Mo Kim; Ho-In Lee; Yongsu Lee; Hyeon Jun Hwang; Moon-Ho; Byoung Hun Lee (ISMVL, 2019)

Extreme Low Power Technology using Ternary Arithmetic Logic Circuits via Drastic Interconnect Length Reduction. - Kiyung Kim; Sunmean Kim; Yongsu Lee; Daeyeon Kim; So-Young Kim; Seokhyeong Kang; Byoung Hun Lee (ISMVL, 2020)

Drastic reliability improvement using H2O2/UV treatment of HfO2 for heterogeneous integration. - Seung-Mo Kim; Thi Mi Hanh Nyugen; Jungwon Oh; Yongsu Lee; Soo Cheol Kang; Ho-In Lee; Cihyun Kim; Surajit Some; Hyeon Jun Hwang; Byoung Hun Lee (IRPS, 2021)