Fuzzy Logic Model of Langmuir Probe Discharge Data. - Byungwhan Kim; Jang-Hyun Park; Beom-Soo Kim (Comput. Chem., 2002)

Prediction of Radio Frequency Impedance Matching in Plasma Equipment Using Neural Network. - Byungwhan Kim; Donghwan Kim; Seung Soo Han (ISNN (2), 2006)

Recognition of Plasma-Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network. - Byungwhan Kim; Sooyoun Kim; Sang Jeen Hong (ISNN (2), 2006)

Prediction of Plasma Enhanced Deposition Process Using GA-Optimized GRNN. - Byungwhan Kim; Dukwoo Lee; Seung Soo Han (ISNN (2), 2006)

Neural Network Recognition of Scanning Electron Microscope Image for Plasma Diagnosis. - Byungwhan Kim; Wooram Ko; Seung Soo Han (PRICAI, 2006)

Diagnosis Model of Radio Frequency Impedance Matching in Plasma Equipment by Using Neural Network and Wavelets. - Byungwhan Kim; Jae Young Park; Donghwan Kim; Seung Soo Han (PRICAI, 2006)

Adaptive Network-Based Fuzzy Inference Model of Plasma Enhanced Chemical Vapor Deposition Process. - Byungwhan Kim; Seongjin Choi (ISNN (1), 2007)

Modeling of Thin Film Process Data Using a Genetic Algorithm-Optimized Initial Weight of Backpropagation Neural Network. - Byungwhan Kim; Hwajune Lee; Donghwan Kim (Appl. Artif. Intell., 2009)

Use of neural network to model X-ray photoelectron spectroscopy data for diagnosis of plasma etch equipment. - Byungwhan Kim; Jeong Kim; Seongjin Choi (Expert Syst. Appl., 2009)

Use of adaptive network fuzzy inference system to predict plasma charging damage on electrical MOSFET properties. - Byungwhan Kim; Hee Ju Kwon; Seongjin Choi (Expert Syst. Appl., 2009)

Optimization of optical lens-controlled scanning electron microscopic resolution using generalized regression neural network and genetic algorithm. - Byungwhan Kim; Sanghee Kwon; Donghwan Kim (Expert Syst. Appl., 2010)

Wavelet-coupled backpropagation neural network as a chamber leak detector of plasma processing equipment. - Byungwhan Kim; Sanghee Kwon (Expert Syst. Appl., 2011)

Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition. - Su Jin Lee; Byungwhan Kim; Sung Wook Baik (Expert Syst. Appl., 2011)

Use of neural network to in situ conditioning of semiconductor plasma processing equipment. - Byungwhan Kim; Daehyun Kim (Appl. Soft Comput., 2012)

Design and VLSI implementation of a high-performance face detection engine. - Dongil Han; Jongho Choi; Byungwhan Kim; Jae Il Cho (Comput. Electr. Eng., 2012)

Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing. - Young-Seon Jeong 001; Byungwhan Kim; Young-Don Ko (Expert Syst. Appl., 2013)