Challenges and opportunity in performance, variability and reliability in sub-45 nm CMOS technologies. - Franck Arnaud; L. Pinzelli; C. Gallon; M. Rafik; P. Mora; Frédéric Boeuf (Microelectron. Reliab., 2011)

Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs. - François Andrieu; Mikaël Cassé; E. Baylac; P. Perreau; O. Nier; Denis Rideau; R. Berthelon; Franck Pourchon; A. Pofelski; Barbara De Salvo; C. Gallon; Vincent Mazzocchi; et al. (ESSDERC, 2014)