Wafer-Scale Bi-Assisted Semi-Auto Dry Transfer and Fabrication of High-Performance Monolayer CVD WS2 Transistor. - Ming-Yang Li; Ching-Hao Hsu; Shin-Wei Shen; Ang-Sheng Chou; Yuxuan Cosmi Lin; Chih-Piao Chuu; Ning Yang; Sui-An Chou; Lin-Yun Huang; Chao-Ching Cheng; Wei-Yen Woon; Szuya Liao; et al. (VLSI Technology and Circuits, 2022)

Perspective on Low-dimensional Channel Materials for Extremely Scaled CMOS. - Sheng-Kai Su; Edward Chen; Terry Y. T. Hung; Meng-Zhan Li; Gregory Pitner; Chao-Ching Cheng; Han Wang; Jin Cai; H.-S. Philip Wong; Iuliana P. Radu (VLSI Technology and Circuits, 2022)

Scaled contact length with low contact resistance in monolayer 2D channel transistors. - Wen-Chia Wu; Terry Y. T. Hung; D. Mahaveer Sathaiya; Dongxu Fan; Goutham Arutchelvan; Chen-Feng Hsu; Sheng-Kai Su; Ang-Sheng Chou; Edward Chen; Weisheng Li; Zhihao Yu; Hao Qiu; et al. (VLSI Technology and Circuits, 2023)

On the Extreme Scaling of Transistors with Monolayer MOS2 Channel. - Wen-Chia Wu; Terry Y. T. Hung; D. Mahaveer Sathaiya; Edward Chen; Chen-Feng Hsu; Walker Yun; Hsiang-Chi Hu; Bo-Heng Liu; T. Y. Lee; Chi-Chung Kei; Wen-Hao Chang; Jin Cai; et al. (VLSI Technology and Circuits, 2024)