Q-factor Integrity of 28nm-node High-k Gate Dielectric. - Ying-Jun Deng; Hao-Lun Hu; Yu-Han Liang; Jian-Ming Chen; Ching-Chuan Chou; Shea-Jue Wang; Mu-Chun Wang (ICKII, 2020)

Fringe Gate Leakage of 28nm HK/MG nMOSFETs with Nitridation Treatments. - De-Cheng Zhang; Ching-Chuan Chou; Ho-Hsiang Chen; Shang-Ze Chen; Jian-Ming Chen; Hui-Yun Bor; Wen-How Lan; Mu-Chun Wang (ICKII, 2020)