Device trends and implications on circuit design in advanced CMOS technologies. - Carlos H. Diaz; K. H. Fung; Ying-Keung Leung; Chung-Cheng Wu; Chih-Ping Chao; G. J. Chern; Wesley L. Lin; Chien-Ming Lee; Fang-Shi Lai; Mi-Chang Chang; Yuan-Chen Sun (CICC, 2005)

A 20nm 112Mb SRAM in High-к metal-gate with assist circuitry for low-leakage and low-VMIN applications. - Jonathan Chang; Yen-Huei Chen; Hank Cheng; Wei-Min Chan; Hung-Jen Liao; Quincy Li; Stanley Chang; Sreedhar Natarajan; Robin Lee; Ping-Wei Wang; Shyue-Shyh Lin; Chung-Cheng Wu; et al. (ISSCC, 2013)

How Social Impact Affects Smartphone Brand Loyalty. - Wei-Hsi Hung; Chih-Lang Tseng; Chin-Fu Ho; Chung-Cheng Wu (J. Comput. Inf. Syst., 2020)

Scaled contact length with low contact resistance in monolayer 2D channel transistors. - Wen-Chia Wu; Terry Y. T. Hung; D. Mahaveer Sathaiya; Dongxu Fan; Goutham Arutchelvan; Chen-Feng Hsu; Sheng-Kai Su; Ang-Sheng Chou; Edward Chen; Weisheng Li; Zhihao Yu; Hao Qiu; et al. (VLSI Technology and Circuits, 2023)

On the Extreme Scaling of Transistors with Monolayer MOS2 Channel. - Wen-Chia Wu; Terry Y. T. Hung; D. Mahaveer Sathaiya; Edward Chen; Chen-Feng Hsu; Walker Yun; Hsiang-Chi Hu; Bo-Heng Liu; T. Y. Lee; Chi-Chung Kei; Wen-Hao Chang; Jin Cai; et al. (VLSI Technology and Circuits, 2024)