Charge-trapping properties of poly-silicon oxides by rapid thermal N2O process. - Chyuan Haur Kao; C. S. Chen; C. H. Lee (Microelectron. J., 2008)

Physical and electrical characteristics of the high-k Nd2O3 polyoxide deposited on polycrystalline silicon. - Chyuan Haur Kao; T. C. Chan; Kung Shao Chen; Yu-Teng Chung; Wen-Shih Luo (Microelectron. Reliab., 2010)