CMOS Compatible Pyroelectric Applications Enabled by Doped HfO2 Films on Deep-Trench Structures. - Clemens Mart; Wenke Weinreich; Malte Czernohorsky; Stefan Riedel; S. Zybell; Kü Kuhnel (ESSDERC, 2018)

IPCEI subcontracts contributing to 22-FDX Add-On Functionalities at GF. - Sabine Kolodinski; Boli Peng; Ciro Esposito; Yves Zimmermann; Michael Schröter; Xin Xu; Paolo Valerio Testa; Corrado Carta; Frank Ellinger; Steffen Lehmann; M. Drescher; Clemens Mart; et al. (ESSDERC, 2019)

Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells. - Tarek Ali; Kati Kühnel; Malte Czernohorsky; Matthias Rudolph; Björn Pätzold; Ricardo Olivo; David Lehninger; Konstantin Mertens; Franz Müller 001; Maximilian Lederer; Raik Hoffmann; Clemens Mart; et al. (IRPS, 2020)

Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in 3D capacitors by TDDB studies. - Alison Erlene Viegas; Konstantinos Efstathios Falidas; Tarek Nadi Ismail Ali; Kati Kühnel; Raik Hoffmann; Clemens Mart; Malte Czernohorsky; Johannes Heitmann (IRPS, 2022)