Design for manufacturing layout analyses correlate layout to physico-chemical yield loss mechanisms. - Christine P. Tan; Congshu Zhou; Yi Tian; Chang Liu; Hein-Mun Lam; Jian Zhang; Mark Lu (CICC, 2013)

Litho-AsymVnet: super-resolution lithography modeling with an asymmetric V-net architecture. - Qing Zhang 008; Yuhang Zhang 008; Wei Lu; Huajie Huang; Zheng Zhong; Congshu Zhou; Yongfu Li 002 (Sci. China Inf. Sci., 2023)