Mechanism of O2-anneal induced Vfb shifts of Ru gated stacks. - Z. Li; Tom Schram; Luigi Pantisano; A. Stesmans; Thierry Conard; S. Shamuilia; V. V. Afanasiev; A. Akheyar; Sven Van Elshocht; D. P. Brunco; W. Deweerd; Y. Naoki; et al. (Microelectron. Reliab., 2007)

High Performance and Yield for Super Steep Retrograde Wells (SSRW) by Well Implant / Si-based Epitaxy on Advanced Technology FinFETs. - U. Rana; D. P. Brunco; S. Raman; Dina H. Triyoso; M. W. Stoker; Jeffrey B. Johnson; Luigi Pantisano; K. D. Seo; M. Zhao; A. Reznicek; R. Krishnan; B. Moser; et al. (DRC, 2019)