Introduction to Voltage-Ramping Wafer Level Electromigration Method and Current Exponent Correction Factor for Co-Capping Metal Lines. - Da Yong Shin; Hyunjun Choi; Joosung Kim; Myungsoo Yeo; Miji Lee; Taiki Uemura; Shin-Young Chung; Jong-Ho Lee (IRPS, 2025)