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Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications. - Chandrasekharan Kothandaraman; X. Chen; Dan Moy; Dallas Lea; Sami Rosenblatt; Faraz Khan; Derek Leu; Toshiaki Kirihata; D. Ioannou; Giuseppe La Rosa; Jeffrey B. Johnson; Norman Robson; et al. (IRPS, 2015)