Effects of thermal annealing on the charge localization characteristics of HfO2/Au/HfO2 stack. - Xuan Feng; Shurong Dong; Hei Wong; Danqun Yu; Kin Leong Pey; Kalya Shubhakar; W. S. Lau (Microelectron. Reliab., 2016)

The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode. - Danqun Yu; W. S. Lau; Hei Wong; Xuan Feng; Shurong Dong; Kin Leong Pey (Microelectron. Reliab., 2016)