CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. - Ernest Y. Wu; Edward J. Nowak; Alex Vayshenker; Wing L. Lai; David L. Harmon (IBM J. Res. Dev., 2002)

Critical reliability challenges in scaling SiO2-based dielectric to its limit. - Ernest Y. Wu; Jordi Suñé; Wing L. Lai; Alex Vayshenker; Edward J. Nowak; David L. Harmon (Microelectron. Reliab., 2003)

Automated system for characterizing short-term feeding behavior and real-time forestomach motility in cattle. - Amanda M. Egert-McLean; Michael P. Sama; James L. Klotz; Kyle R. McLeod; Neils B. Kristensen; David L. Harmon (Comput. Electron. Agric., 2019)