Enhancing Si3N4 Selectivity over SiO2 in Low-RF Power NF3-O2 Reactive Ion Etching: The Effect of NO Surface Reaction. - Nguyen Hoang Tung; Heesoo Lee; Duy Khoe Dinh; Dae-Woong Kim; Jin Young Lee; Geon Woong Eom; Hyeong-U. Kim; Woo Seok Kang (Sensors, 2024)