Optimization of low temperature silicon nitride processes for improvement of device performance. - E. Sleeckx; Marc Schaekers; X. Shi; E. Kunnen; B. Degroote; M. Jurczak; Muriel de Potter de ten Broeck; E. Augendre (Microelectron. Reliab., 2005)

WS2 transistors on 300 mm wafers with BEOL compatibility. - Tom Schram; Quentin Smets; Benjamin Groven; M. H. Heyne; E. Kunnen; A. Thiam; Katia Devriendt; Annelies Delabie; Dennis Lin; M. Lux; Daniele Chiappe; I. Asselberghs; et al. (ESSDERC, 2017)