On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD. - Salvador Dueñas; Helena Castán; Héctor García; J. Barbolla; E. San Andrés; I. Mártil; G. González-Díaz (Microelectron. Reliab., 2005)

Positive bias temperature instabilities on sub-nanometer EOT FinFETs. - P. C. Feijoo; Moonju Cho; Mitsuhiro Togo; E. San Andrés; Guido Groeseneken (Microelectron. Reliab., 2011)