Evaluation of Deep Autoencoders for Prediction of Adjustment Points in the Mass Production of Sensors. - Martin Lachmann; Tilman Stark; Martin Golz; Eberhard Manske (ML4CPS, 2017)

Linear Displacement Calibration System Integrated with a Novel Auto-Alignment Module for Optical Axes. - Yi-Chieh Shih; Pi-Cheng Tung; Yung-Cheng Wang; Lih-Horng Shyu; Eberhard Manske (Sensors, 2020)

Picometer-Scale Positioning of a Linear Drive System via Feedforward-Feedback Control. - Alex S. Huaman; Michael Katzschmann; Steffen Hesse; Christoph Schäffel; Christoph Weise; Denis Dontsov; Eberhard Manske; Johann Reger (ICM, 2021)

Processing and Analysis of Long-Range Scans with an Atomic Force Microscope (AFM) in Combination with Nanopositioning and Nanomeasuring Technology for Defect Detection and Quality Control. - Ingo Ortlepp; Jaqueline Stauffenberg; Eberhard Manske (Sensors, 2021)

A GPS-Referenced Wavelength Standard for High-Precision Displacement Interferometry at λ = 633 nm. - Ulrike Blumröder; Paul Köchert; Thomas Fröhlich 002; Thomas Kissinger; Ingo Ortlepp; Jens Flügge; Harald Bosse; Eberhard Manske (Sensors, 2023)

Single Dopant Lithography for the Fabrication of Atomic-scale Devices and Quantum Systems. - Ivo W. Rangelow; Thomas Schenkel; Arun Persaud; Zahid Durrani; Mervyn Jones; Hans-Georg Pietscher; Fabian Dietrich; Aditya S. Tan; Jaqueline Stauffenberg; Eberhard Manske; Thomas Fröhlich 002; Dimitre Karpuzov (MIXDES, 2024)

Polarization Camera based Fringe Locking Control of a Writing Head for Scanning Beam Interference Lithography. - Josias Rühle; Kevin Treptow; Christian Schober; Christof Pruss; Tobias Haist; Ingo Ortlepp; Oliver Sawodny; Stephan Reichelt; Thomas Kissinger; Eberhard Manske (ACC, 2025)