Non Contact Surface Potential Measurements for Charging Reduction During Manufacturing of Metal-Insulator-Metal Capacitors. - Jan Ackaert; Zhichun Wang; Eddy De Backer; P. Colson; Peter Coppens (Microelectron. Reliab., 2001)

Correlation between predicted cause of SRAM failures and in-line defect data. - Peter Coppens; Guido Vanhorebeek; Eddy De Backer (Microelectron. Reliab., 2001)

Charging induced damage by photoconduction through thick inter metal dielectrics. - Jan Ackaert; Klara Bessemans; Eddy De Backer (Microelectron. Reliab., 2003)

Plasma Charging Damage Reduction in IC Processing by A Self-balancing Interconnect. - Zhichun Wang; Jan Ackaert; Cora Salm; Fred G. Kuper; Eddy De Backer (Microelectron. Reliab., 2004)

MIMC reliability and electrical behavior defined by a physical layer property of the dielectric. - Jan Ackaert; R. Charavel; K. Dhondt; B. Vlachakis; Luc De Schepper; M. Millecam; E. Vandevelde; P. Bogaert; A. Iline; Eddy De Backer; Alexandru Vlad; Jean-Pierre Raskin (Microelectron. Reliab., 2008)

Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices. - R. Charavel; Jaume Roig; S. Mouhoubi; P. Gassot; Filip Bauwens; Piet Vanmeerbeek; B. Desoete; Peter Moens; Eddy De Backer (Microelectron. Reliab., 2010)