PREVAIL-Electron projection technology approach for next-generation lithography. - Rajinder S. Dhaliwal; William A. Enichen; Steven D. Golladay; Michael S. Gordon; Rodney A. Kendall; Jon E. Lieberman; Hans C. Pfeiffer; David J. Pinckney; Christopher F. Robinson; James D. Rockrohr; Werner Stickel; Eileen V. Tressler (IBM J. Res. Dev., 2001)