Enrique Miranda

Orcid: 0000-0003-0470-5318

Affiliations:
  • Autonomous University of Barcelona, Spain


According to our database1, Enrique Miranda authored at least 31 papers between 2002 and 2023.

Collaborative distances:
  • Dijkstra number2 of five.
  • Erdős number3 of four.

Timeline

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Bibliography

2023
Variability in Resistive Memories.
Adv. Intell. Syst., June, 2023

2022
Connectome of memristive nanowire networks through graph theory.
Neural Networks, 2022

Beneficial Role of Noise in Hf-based Memristors.
Proceedings of the IEEE International Symposium on Circuits and Systems, 2022

2021
Line Resistance Impact in Memristor-based Multi Layer Perceptron for Pattern Recognition.
Proceedings of the 12th IEEE Latin America Symposium on Circuits and System, 2021

2020
Application of the Quasi-Static Memdiode Model in Cross-Point Arrays for Large Dataset Pattern Recognition.
IEEE Access, 2020

Offline Training for Memristor-based Neural Networks.
Proceedings of the 28th European Signal Processing Conference, 2020

2018
A new method for estimating the conductive filament temperature in OxRAM devices based on escape rate theory.
Microelectron. Reliab., 2018

SPICE simulation of memristive circuits based on memdiodes with sigmoidal threshold functions.
Int. J. Circuit Theory Appl., 2018

2017
Voltage-Driven Hysteresis Model for Resistive Switching: SPICE Modeling and Circuit Applications.
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst., 2017

Identification of the generation/rupture mechanism of filamentary conductive paths in ReRAM devices using oxide failure analysis.
Microelectron. Reliab., 2017

Equivalent circuit model for the electron transport in 2D resistive switching material systems.
Proceedings of the 47th European Solid-State Device Research Conference, 2017

2015
Electrical characterization of multiple leakage current paths in HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>-based nanolaminates.
Microelectron. Reliab., 2015

Equivalent circuit modeling of the bistable conduction characteristics in electroformed thin dielectric films.
Microelectron. Reliab., 2015

Threading dislocations in III-V semiconductors: Analysis of electrical conduction.
Proceedings of the IEEE International Reliability Physics Symposium, 2015

Modeling of the conduction characteristics of voltage-driven bipolar RRAMs including turning point effects.
Proceedings of the 45th European Solid State Device Research Conference, 2015

2014
Single-parameter model for the post-breakdown conduction characteristics of HoTiO<sub>x</sub>-based MIM capacitors.
Microelectron. Reliab., 2014

2013
Direct observation of the generation of breakdown spots in MIM structures under constant voltage stress.
Microelectron. Reliab., 2013

Field-effect control of breakdown paths in HfO<sub>2</sub> based MIM structures.
Microelectron. Reliab., 2013

2012
Analysis and modeling of the gate leakage current in advanced nMOSFET devices with severe gate-to-drain dielectric breakdown.
Microelectron. Reliab., 2012

2011
An extension of the Curie-von Schweidler law for the leakage current decay in MIS structures including progressive breakdown.
Microelectron. Reliab., 2011

Industrial electrostatics perforation improvement by power controlled discharges.
Proceedings of EUROCON 2011, 2011

2010
Exploratory analysis of the breakdown spots spatial distribution in metal gate/high-K/III-V stacks using functional summary statistics.
Microelectron. Reliab., 2010

Effect of the Electric Discharge Confinement on the Perforation Density of Porous Materials.
Proceedings of the Annual Meeting of the IEEE Industry Applications Society, 2010

2009
Effects of the electrical stress on the conduction characteristics of metal gate/MgO/InP stacks.
Microelectron. Reliab., 2009

2008
Compact modeling of the non-linear post-breakdown current in thin gate oxides using the generalized diode equation.
Microelectron. Reliab., 2008

2005
The TDDB power-law model - Physics and experimental evidences.
Microelectron. Reliab., 2005

Degradation of high-K LA<sub>2</sub>O<sub>3</sub> gate dielectrics using progressive electrical stress.
Microelectron. Reliab., 2005

A function-fit model for the hard breakdown I-V characteristics of ultra-thin oxides in MOS structures.
Microelectron. Reliab., 2005

2004
Electron transport through broken down ultra-thin SiO<sub>2</sub> layers in MOS devices.
Microelectron. Reliab., 2004

Single-equation model for low and high voltage soft breakdown conduction.
Microelectron. Reliab., 2004

2002
Modeling of the I-V characteristics of high-field stressed MOS structures using a Fowler-Nordheim-type tunneling expression.
Microelectron. Reliab., 2002


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