Effect of thermal annealing in H2 atmosphere of SiCxOy films obtained by HFCVD technique. - Juan Carlos Pérez Trinidad; Marco Antonio Vasquez-Agustin; Godofredo García Salgado; Román Romano-Trujillo; Fernando Lopez-Marcos; Heber Vilchis; Enrique Rosendo Andrés; José Juan Gervacio Arciniega; Orlando Cortazar Martínez; Antonio Coyopol Solís (CCE, 2023)