Achieving < ±25 ppb Frequency Stability With a ±0.125 °C Oven Control on a Si Interposer for an AlScN-on-Si Shear-BAW Resonator. - Everestus Ezike; Ratul Kundu; Shaurya Dabas; Banafsheh Jabbari; Shruti Mishra; Dicheng Mo; Honggyu Kim; Zetian Mi; Roozbeh Tabrizian; Baibhab Chatterjee (IEEE Trans. Circuits Syst. I Regul. Pap., 2025)