Electrochemical Phenomena in Thin Films of Silicon Dioxide on Silicon. - Donald P. Seraphim; Andrew E. Brennemann; Francois Max d'Heurle; Harold L. Friedman (IBM J. Res. Dev., 1964)

Reduction of electromigration in aluminium films by copper doping. - Irving Ames; Francois Max d'Heurle; Richard E. Horstmann (IBM J. Res. Dev., 2000)