Effect of vacuum break after the barrier layer deposition on the electromigration performance of aluminum based line interconnects. - Cher Ming Tan; Arijit Roy 001; Kok Tong Tan; Derek Sim Kwang Ye; Frankie Low (Microelectron. Reliab., 2005)

Development of highly accelerated electromigration test. - Cher Ming Tan; Wei Li; Kok Tong Tan; Frankie Low (Microelectron. Reliab., 2006)