Investigations on double-diffused MOS transistors under ESD zap conditions. - Gianluca Boselli; Stan Meeuwsen; Ton J. Mouthaan; Fred G. Kuper (Microelectron. Reliab., 2001)

The time-voltage trade-off for ESD damage threshold in amorphous silicon hydrogenated thin-film transistors. - N. Tosic Golo; S. van der Wal; Fred G. Kuper; Ton J. Mouthaan (Microelectron. Reliab., 2001)

Zapping thin film transistors. - N. Tosic Golo; Fred G. Kuper; Ton J. Mouthaan (Microelectron. Reliab., 2002)

Fast temperature cycling and electromigration induced thin film cracking in multilevel interconnection: experiments and modeling. - H. V. Nguyen; Cora Salm; J. Vroemen; J. Voets; Benno Krabbenborg; Jaap Bisschop; A. J. Mouthaan; Fred G. Kuper (Microelectron. Reliab., 2002)

Simulation and experimental characterization of reservoir and via layout effects on electromigration lifetime. - H. V. Nguyen; Cora Salm; R. Wenzel; A. J. Mouthaan; Fred G. Kuper (Microelectron. Reliab., 2002)

The influence of technology variation on ggNMOSTs and SCRs against CDM BSD stress. - M. S. B. Sowariraj; Theo Smedes; Cora Salm; Ton J. Mouthaan; Fred G. Kuper (Microelectron. Reliab., 2002)

Reservoir effect and maximum allowed VIA misalignment for AlCu interconnect with tungsten VIA plug. - Yuan Li; Klaas Jelle Veenstra; Jérôme Dubois; Lei Peters-Wu; Agnes van Zomeren; Fred G. Kuper (Microelectron. Reliab., 2003)

Role of package parasitics and substrate resistance on the Charged Device Model (CDM) failure levels -An explanation and die protection strategy. - M. S. B. Sowariraj; Theo Smedes; Cora Salm; Ton J. Mouthaan; Fred G. Kuper (Microelectron. Reliab., 2003)

Applying the fWLR concept to Stress induced leakage current in non-volatile memory processes. - Guoqiao Tao; Andrea Scarpa; Leo van Marwijk; Kitty van Dijk; Fred G. Kuper (Microelectron. Reliab., 2004)

Plasma Charging Damage Reduction in IC Processing by A Self-balancing Interconnect. - Zhichun Wang; Jan Ackaert; Cora Salm; Fred G. Kuper; Eddy De Backer (Microelectron. Reliab., 2004)

A 3-D Circuit Model to evaluate CDM performance of ICs. - M. S. B. Sowariraj; Theo Smedes; Peter C. de Jong; Cora Salm; Ton J. Mouthaan; Fred G. Kuper (Microelectron. Reliab., 2005)

Reduced temperature dependence of hot carrier degradation in deuterated nMOSFETs. - Cora Salm; André J. Hof; Fred G. Kuper; Jurriaan Schmitz (Microelectron. Reliab., 2006)

Automotive IC reliability: Elements of the battle towards zero defects. - Fred G. Kuper (Microelectron. Reliab., 2008)

RF CMOS reliability simulations. - Guido T. Sasse; Mustafa Acar; Fred G. Kuper; Jurriaan Schmitz (Microelectron. Reliab., 2008)