Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ZrO2 film as gate dielectric with improved reliability. - Min-Ching Chu; Jagan Singh Meena; Chih-Chia Cheng; Hsin-Chiang You; Feng-Chih Chang; Fu-Hsiang Ko (Microelectron. Reliab., 2010)

Flexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer. - Jagan Singh Meena; Min-Ching Chu; Jitendra N. Tiwari; Hsin-Chiang You; Chung-Hsin Wu; Fu-Hsiang Ko (Microelectron. Reliab., 2010)

Fabrication and enhanced field emission properties of novel silicon nanostructures. - Srikanth Ravipati; Chang-Jung Kuo; Jiann Shieh; Cheng-Tung Chou; Fu-Hsiang Ko (Microelectron. Reliab., 2010)

Weathering-Resistant Replicas Fabricated by a Three-Dimensional Printing Robotic Platform Induce Shoaling Behavior in Zebrafish. - Wei-Lin Wu; Di-Ching Li; Yen-Shuo Chen; Fu-Hsiang Ko (Sensors, 2022)