Molybdenum Nitride as a Scalable and Thermally Stable pWFM for CFET. - Hiroaki Arimura; S. Brus; Jacopo Franco; Yusuke Oniki; A. Vandooren; T. Conard; B. T. Chan; B. Kannan; M. Samiee; W. Li; P. Deminskyi; E. Shero; et al. (VLSI Technology and Circuits, 2023)

Vt Fine-Tuning in Multi-Vt Gate-All-Around Nanosheet nFETs Using Rare-Earth Oxide-Based Dipole-First Gate Stack Compatible with CFET Integration. - Hiroaki Arimura; Hans Mertens; Jacopo Franco; L. Lukose; W. Maqsood; S. Brus; Thomas Chiarella; A. Impagnatiello; S. Homkar; V. K. Mootheri; C. Yin; G. Alessio Verni; et al. (VLSI Technology and Circuits, 2024)