Verification and reduction of surface charging during high/medium current implantations by implementing plasma damage monitoring. - C. Cantin; G. Gove; G. Polisski (Microelectron. Reliab., 2009)

Charging control on high energy implanters: A process requirement demonstrated by plasma damage monitoring. - C. Cantin; C. Laviron; G. Gove (Microelectron. Reliab., 2009)