Optimization and simulation of exposure pattern for scanning laser lithography. - Omid T. Ghalehbeygi; Garth Berriman; Andrew J. Fleming; John L. Holdsworth (CCA, 2015)

Design, modeling, and characterization of an XY nanopositioning stage constructed from a single sheet of piezoelectric material. - Andrew J. Fleming; Garth Berriman; Yuen Kuan Yong (AIM, 2016)