Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography. - Yuelin Du; Qiang Ma 002; Hua Song; James P. Shiely; Gerard Luk-Pat; Alexander Miloslavsky; Martin D. F. Wong (DAC, 2013)

A high-performance triple patterning layout decomposer with balanced density. - Bei Yu 001; Yen-Hung Lin; Gerard Luk-Pat; Duo Ding; Kevin Lucas; David Z. Pan (ICCAD, 2013)