Impact of Hf content on positive bias temperature instability reliability of HfSiON gate dielectrics. - H. W. Chen; Chuan-Hsi Liu (Microelectron. Reliab., 2010)

Electrical characteristics and reliability properties of metal-oxide-semiconductor capacitors with HfZrLaO gate dielectrics. - Chuan-Hsi Liu; H. W. Chen (Microelectron. Reliab., 2010)

The Demonstration of Gate Dielectric-fuse 4kb OTP Memory Feasible for Embedded Applications in High-k Metal-gate CMOS Generations and Beyond. - E. R. Hsieh; C. W. Chang; C. C. Chuang; H. W. Chen; Steve S. Chung (VLSI Circuits, 2019)