Electron beam lithography tool for manufacture of X-ray masks. - Timothy R. Groves; John G. Hartley; Hans C. Pfeiffer; Denise Puisto; Donald K. Bailey (IBM J. Res. Dev., 1993)

PREVAIL-Electron projection technology approach for next-generation lithography. - Rajinder S. Dhaliwal; William A. Enichen; Steven D. Golladay; Michael S. Gordon; Rodney A. Kendall; Jon E. Lieberman; Hans C. Pfeiffer; David J. Pinckney; Christopher F. Robinson; James D. Rockrohr; Werner Stickel; Eileen V. Tressler (IBM J. Res. Dev., 2001)