Improved estimation of the resistivity of pure copper and electrical determination of thin copper film dimensions. - Constance E. Schuster; Mark G. Vangel; Harry A. Schafft (Microelectron. Reliab., 2001)

Early reliability assessment by using deep censoring. - Harry A. Schafft; Linda M. Head; Jason Gill; Timothy D. Sullivan (Microelectron. Reliab., 2003)

Modeling and simulation of resistivity of nanometer scale copper. - A. Emre Yarimbiyik; Harry A. Schafft; Richard A. Allen; Mona E. Zaghloul; David L. Blackburn (Microelectron. Reliab., 2006)

Experimental and simulation studies of resistivity in nanoscale copper films. - A. Emre Yarimbiyik; Harry A. Schafft; Richard A. Allen; Mark D. Vaudin; Mona E. Zaghloul (Microelectron. Reliab., 2009)